MKS ASTeX ASTRON 2L is a high-performance Remote Plasma Source (RPS) primarily used in semiconductor manufacturing for chemical vapor deposition (CVD) chamber cleaning and thin-film processing. This system is designed as a self-contained, "lid-mount" unit that generates reactive gas radicals—like atomic fluorine from cap N cap F sub 3
Transition 1: Maintain Argon flow while introducing 1/5th of the planned NF3cap N cap F sub 3 flow for 5 seconds. Transition 2: Increase NF3cap N cap F sub 3 flow to 2/3 of the total value over another 5 seconds. Full Flow: Set NF3cap N cap F sub 3 to its full value for the duration of the cleaning cycle. 3. Safety & Maintenance Hazardous Gases: NF3cap N cap F sub 3
If you are looking for specific pinout diagrams or step-by-step troubleshooting for a particular error code, I can look that up if you provide the model revision or serial number. ASTRON ATOMIC FLUORINE GENERATOR AX7680 SERIES mks astron 2l manual
Based on technical documentation for the Astron series, the 2L model typically includes the following features: Integrated Design
This article aggregates everything you would find in the official manual, including setup procedures, pinout configurations, degassing protocols, and common fault fixes. MKS ASTeX ASTRON 2L is a high-performance Remote
efficiently while maintaining low electric fields to prevent reactor wall damage.
to produce atomic fluorine for high-efficiency chamber cleaning. Input Power: Typically 180–228 VAC, 3-phase, 50/60 Hz. Gas Requirements: Ignition: Requires 100% Argon ( Process: Supports up to 3.0 slm of Nitrogen Trifluoride ( NF3cap N cap F sub 3 Operating Pressure: During Ignition: 1 to 4 Torr. Post-Ignition: 1 to 10 Torr. Full Flow: Set NF3cap N cap F sub
ASTRON AX7680 Series Manual: Provides detailed installation and safety instructions for similar reactive gas generators.